WILSONVILLE, Ore., October 16, 2012—Mentor Graphics Corp. (NASDAQ: MENT) today announced that TSMC has presented Mentor with two “Partner of the Year 2012” awards in the categories for “Joint Delivery of the 20nm Reference Flow” and “CoWoS Design Enablement and Test Vehicle Development,” at the TSMC Open Innovation Platform Forum held today in San Jose, Calif. The awards, presented during the morning keynote sessions, underscore the continuing collaboration between TSMC and Mentor to deliver advanced design enablement capabilities to leading edge IC designers.
“It’s exciting to see designers’ choices expanding with the ability to drive traditional transistor scaling to 20nm, and at the same time having the option to increase density, performance and power reduction with 3D designs,” said Michael Buehler-Garcia, senior director of marketing for Calibre Design Solutions at Mentor Graphics. “Mentor Graphics is extremely pleased to receive TSMC’s recognition of our efforts, and we highly value the opportunity to continue collaborating and innovating with TSMC to bring new solutions to market.”
“Mentor has partnered with TSMC to bring innovation and deep technical experience to address new challenges such as 20nm double patterning and 3D IC design,” said Suk Lee, TSMC senior director, Design Infrastructure Marketing Division. “Mentor solves problems and brings added value to each new generation of IC design. We are pleased to present this award to Mentor and look forward to innovative solutions from them in the years to come.”
(Mentor Graphics is a registered trademark of Mentor Graphics Corporation. All other company or product names are the registered trademarks or trademarks of their respective owners)