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Foundry Solution Blog

Posts tagged with 'EUV shadowing'

3 Mar, 2014

Shelly Stalnaker The semiconductor industry can (and does) argue about when extreme ultraviolet lithography will be ready for production. However, the actual dates are irrelevant to those engineers who must prepare OPC tools and processes for the EUV-specific effects that will have to be managed in manufacturing. They are busy now, evaluating the impact of such challenges as the distortion caused by EUV shadowing. In … Read More

SRAF, scanner, EUV shadowing, extreme ultraviolet, EUV, mask, OPC, ic manufacturing, Lithography

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