Mentor Releases New Calibre Versions Using Interoperable iDRC and iLVS Formats Introduced by TSMC
WILSONVILLE, Ore., July 23, 2009 – Mentor Graphics Corporation (NASDAQ: MENT) today announced that its Calibre® nmDRC and nmLVS offerings now support the interoperable iDRC and iLVS formats introduced by TSMC. TSMC and Mentor Graphics collaborated on these vendor-neutral formats for describing physical verification and layout vs. schematic (LVS) checks. The iDRC and iLVS syntaxes make it possible for TSMC and its customers to create verification decks that will work with Mentor’s Calibre nmDRC and nmLVS offerings or other verification products that support the specification. Mentor will optimize the underlying implementation of iDRC/iLVS to deliver optimum performance to end users.
The iDRC and iLVS specifications are based on the open source TCL language extended with specialized functions for verification. It has been validated on the Calibre platform for 40nm designs manufactured at TSMC, and will be rolled out as part of the TSMC reference flow for 28nm designs.
“The TSMC iDRC ands iLVS formats benefit both TSMC and its customers by making it possible to define and customize complex verification rules for each of our processes that can in turn drive verification tools from any supporting vendor,” said ST Juang, senior director of Design Infrastructure Marketing at TSMC. “This enables us and our customers to easily adapt design rules to new requirements or special situations without worrying about tuning and testing for different tool flows. We’ve worked closely with Mentor on the architecture and syntax of iDRC and iLVS and have completed first validation on the Calibre tool suite as our lead physical verification platform.”
“Our collaboration with TSMC on the definition of iDRC and iLVS helps our mutual customers realize the best possible performance from Calibre products,” said Joseph Sawicki, vice president and general manager for the Design-to-Silicon division at Mentor Graphics. “With this collaboration, TSMC ensures their design guidelines are delivered in a consistent manner to all qualified vendors, and Mentor can use its proprietary technology to continue delivering industry-leading verification platforms with the fastest and most efficient underlying code possible.”
The Calibre implementation of iDRC and iLVS converts iDRC decks into highly-tuned native Calibre SVRF calls for optimum runtime performance. It also includes an interactive TCL debugger with breakpoints and variable monitors integrated with a layout debugger, which is part of the Calibre Results Viewing Environment (RVE), and a special in-line SVRF viewer.
Price and Availability
The Calibre implementation of iDRC is currently being evaluated at selected TSMC and Mentor customer sites. General availability is expected at the end of 2009.
About Mentor Graphics
Mentor Graphics Corporation (NASDAQ: MENT) is a world leader in electronic hardware and software design solutions, providing products, consulting services and award-winning support for the world’s most successful electronics and semiconductor companies. Established in 1981, the company reported revenues over the last 12 months of about $800 million and employs approximately 4,425 people worldwide. Corporate headquarters are located at 8005 S.W. Boeckman Road, Wilsonville, Oregon 97070-7777. World Wide Web site: http://www.mentor.com/.
(Mentor Graphics and Calibre are registered trademarks of Mentor Graphics Corporation. All other company or product names are the registered trademarks or trademarks of their respective owners.)
For more information, please contact:
Gene Forte
Mentor Graphics
503.685.1193
gene_forte@mentor.com
Sonia Harrison
Mentor Graphics
503.685.1165
sonia_harrison@mentor.com
Manufacturing Variability Press Releases
- Mentor Graphics Yafei Luo Receives International Conference on Electronics Packaging (ICEP) Young Award from IEEE Components Packaging & Manufacturing Technology Society (May 24, 2013)
- Mentor Graphics Reports Fiscal First Quarter Results and Announces Dividend (May 23, 2013)
- Mentor Graphics Teams with OpSIS Foundries and Lumerical Solutions on PDK Development for IME Silicon Photonics Process (May 22, 2013)
- L-3 Link Simulation & Training Cuts Engineering Change Orders by Ninety Percent Using Capital Software from Mentor Graphics (May 21, 2013)
- Mentor and Tezzaron Optimize Calibre 3DSTACK for 2.5/3D-ICs (May 20, 2013)
- CNH Enhances Electrical Design Capabilities with Latest Mentor Graphics Capital and VeSys Software (May 15, 2013)
- Mentor Graphics Pyxis Platform and PDK Automation Process Adopted by MagnaChip Semiconductor (May 14, 2013)
- Mentor Graphics Announces Software Vital For Wire Harness Supplier Competitiveness (May 8, 2013)
- Mentor Graphics Accelerates SoC and Embedded System Delivery with a Native Embedded Software Environment for Pre- and Post-Silicon Development, Embedding QEMU, SystemC and Emulation (Apr 22, 2013)
- Mentor Graphics Announces Successful Integration of the MontaVista Automotive Technology Platform into a Yocto Project 1.3 and GENIVI 3.0-compliant Platform (Apr 18, 2013)