A Comprehensive, Flexible Tapeout-to-Mask Flow
Mentor’s Tapeout-to-Mask solution provides best-in-class accuracy, speed, and cost of ownership. We provide all the tools required to turn a GDSII physical design (layout) into a resolution-enhanced, fractured mask set ready for manufacturing.
Our tapeout-to-mask flow is consistent and flexible because…
- All our tools are built on the Calibre® hierarchical geometry engine
- We use OASIS as the underlying database format
- We employ a unified command language across all our tools
This makes it easier for you to rapidly build a fully-integrated tapeout-to-mask flow, and lets you tune the flow for the fastest turnaround time (TAT) and highest throughput.
Tapeout-to-Mask Solution Summary
Mentor’s tapeout-to-mask solution gives you a full complement of third-generation resolution enhancement (RET) and mask fabrication tools for all process nodes:
- Mask synthesis
- Resolution enhancement
- Scattering bars
- Phase shift mask assignment
- Double patterning (LELE)
- DDL decomposition
- Optical proximity correction (OPC)
- OPC verification
- Mask optical proximity correction (MPC)
- Mask manufacturability assessment
- Mask fracturing in Micronic, JEOL, MEBES, Toshiba and Hitachi formats
- Process model and tool setup workbench
- Mask viewing and merging utilities
- Simulated silicon print image utility
Virtual Manufacturing Ensures Success
Calibre gives you a virtual manufacturing environment that simulates the lithography process for each mask layer to determine pattern transfer accuracy before manufacturing. By assessing manufacturability during mask-making, you can reduce TAT and re-spins, while ensuring the highest quality results on all popular mask writers. Our full-chip, grid-based simulation catches unwanted printing features that sparse simulation cannot detect, such as side lobes and printing sbars. Easy-to-use viewing tools allow you to quickly assess any problem areas.
Scalability for Fast Turnaround for Any Size Design
All Calibre tools take advantage of design hierarchy to improve TAT, computational efficiency, and throughput, as compared to flat processing tools. Calibre is highly scalable, so TAT depends only on available hardware. You can take advantage of any number of standard multi-threaded x86 platforms, and you can add co-processor acceleration using the most advanced multicore processors for high performance and low cost of operation.
Integrated Flow All the Way Through Mask Fabrication
Our Mask Data Preparation (MDP) tools are fully compatible with the Calibre platform, enabling you to complete all resolution enhancement processing and mask data format conversions in one batch run. Calibre MDP provides:
- Layer derivation
- Planarization fill
- Global and selective sizing
- Hierarchical mask rule checking (MRC)
- Mask proximity correction (MPC).
We provide output for the predominant mask writer formats in the sub-wavelength era (such as MEBES and Variable-Shaped-Beam), as well as GDSII.
Find out more about how Calibre IC Manufacturing solutions can speed up your development cycle while improving results and lowering costs.
Mentor delivers solutions tailored to your key challenges in the GDSII-to-Mask flow including maintaining tight critical dimension (CD) control for high wafer yield and reducing time-to-mask, cost of operation, and the duration and cost of new technology development. IC Manufacturing
White Paper: The trend to reduce critical features dimension has dramatically increased design file size. Design tape–out flows at the 28 nm technology node handle post-OPC data files that reach hundreds of gigabytes.... View White Paper
White Paper: OPC models describe the entire patterning process, including photomask, optics, resist, and etch as a set of separately characterized modules. It is difficult, however, to definitively calibrate the optics... View White Paper