Resources
Manufacturing Variability Challenges
Design
Mentor’s variability-aware/timing-aware place and route system delivers “correct-by-construction” layouts concurrently optimized for both performance and yield across any number of modes and corners.
Enhance
Mentor’s Calibre® platform provides the fastest, most accurate, and most reliable integrated verification, extraction and design-for-manufacturing (DFM) platform for both library cells and full chips.
Fabricate
Mentor’s fast, accurate, and cost-effective mask resolution enhancement and data prep flows ensure quick mask turnaround and high manufacturability at 65 nm, 45 nm, 32 nm and beyond.
Ramp
Mentor’s production yield solution combines the power of diagnosis-driven yield analysis and high-quality manufacturing test to accelerate yield ramp.