Services to Ensure Your Success
Design Enablement and Customization Services
The growing impact of design characteristics on yield demands new and creative solutions to assure manufacturability. Migration to the next technology node creates peak demands for engineers and expertise that often exceeds available resources, putting time to market at risk.
Optimizing your tool flow for your specific design and manufacturing strategy can give your higher performing devices, better yield and faster time-to-market for a significant competitive advantage. Meeting these challenges requires best-in-class tools and engineering expertise to develop advanced modeling and hands-on solutions.
Mentor Consulting Design Enablement and Customization Services provide the expertise and project management skills required for effective deployment of advanced technologies. We have successfully helped customers worldwide meet their objectives of on-time technology, high-quality and accurate designs, optimal performance, higher yield, and faster turn-around-time, time-to-market and yield ramp. Consultants also ensure knowledge transfer to enable continued success and accelerated adoption of technologies and methodologies.
Service Offerings
- Design-for-Manufacturing solution to manage manufacturing variability based on Calibre technology and methodology
- Delivery of highest quality rule decks, OPC models and recipes, and other solution components
- Expert resources for peak demands and special projects
- Engineering methodology and flow automation
Service Benefits
- On-time technology
- Optimal performance
- Lower cost of ownership
- Knowledge transfer of advanced technologies for accelerated adoption of Calibre platform
Calibre® Expertise
Yield Enhancement Services consultants are the leading expert engineers in the world on the use of the Calibre® design-to-silicon platform:
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Resolution Enhancement Technologies
Calibre OPC, Calibre nmOPC, Calibre OPCverifyTM, Calibre MDP
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Physical Verification Technologies
Calibre DRCTM, Calibre LVS, Calibre xRCTM
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Calibre Design for Manufacturing Solutions
Calibre YieldAnalyzer, Calibre YieldEnhancer, Calibre YieldServer, Calibre LFDTM (Litho Friendly Design), Calibre CMPAnalyzer (for Chemical Mechanical Processing)
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Yield Diagnostics
YieldAssistTM
About Mentor Consulting
Mentor Consulting provides customers with excellence and expertise in electronic design automation infrastructure and methodology, including solutions for silicon yield enhancement, verification, cabling, and data management. Mentor Consulting is engaged by forward-looking electronics companies worldwide to optimize design productivity and advance adoption of the latest industry design best practices. It is the only service partner in the industry that invests in the transfer of knowledge to its customers to ensure a smooth deployment and integration of new tools and methods. By taking full advantage of Mentor Consulting services, and the capabilities of the Calibre platform and yield diagnostics tools, customers achieve faster development cycle time, higher yield and faster time to market. For more information, contact us at mentor_consulting@mentor.com or visit www.mentor.com/consulting.
Mentor Consulting: Optimal Performance
Achieving Optimal Performance
Achieving fast turnaround time (TAT) in the GDS-to mask flow is essential for competitiveness and profitability. Fast TAT enables faster time to market, higher customer satisfaction, higher market share and better fab utilization. Our consultants provide the expertise and project management skills required to complete critical tasks. YES consultants work with you to identify the bottlenecks, define and prioritize opportunities, and deliver the improvements needed to accomplish your goals.
These may include the optimization of physical verification rule files, migration to the latest releases of Calibre to take full advantage of new capabilities, and optimizing OPC models and recipes for speed and accuracy. By taking full advantage of Mentor Consulting services and the capabilities of the Calibre platform, customers have reduced TAT by more than 50% while maintaining accuracy and reliability.
Mentor Consulting:On-Time Technology
Assuring On-Time Technology
On-time technology has long been recognized in the semiconductor industry as critical to success. Mentor Consulting provides creative solutions to accelerate development of physical verification rule decks, OPC models and recipes, and process design kits. These solutions include building automated methodologies for rule deck and OPC development, and QA, as well as providing expert resources to meet peak demands.
YES consultants have successfully implemented automated flows for physical verification and OPC development. This has substantially reduced engineering cycle time and increased productivity so that decks and OPC solutions can be released faster, at highest quality standards, and at a lower cost.
Mentor Consulting:Lower TCO
Lower Cost of Ownership
Mentor Consulting enables low cost of ownership by providing efficient, automated methodologies and expert resources that reduce engineering cycle time and increase productivity. Solutions are delivered faster and at lower cost. Many customers have reduced permanent staff and fixed costs by relying on YES consultants to meet peak demands or to meet requirements for specialized expertise.
Mentor Consulting:Accelerating the Learning Curve
Accelerating the Learning Curve
YES consultants not only provide hands-on creative solutions for design and manufacturing challenges, they ensure the teams they work with also learn the technologies, best practices and methodologies used during the consulting engagement. Knowledge transfer and an accelerated learning curve help engineering teams continue to meet business objectives.
Mentor Consulting:Experts in GDS to Mask
Experts in the GDS to Mask Flow
Mentor Consulting provides the expertise and project management skills required for effective deployment of solutions for the Calibre® platform from Mentor Graphics. This includes:
- Calibre® DRCTM, LVS and xRCTM for physical verification and extraction technologies
- Calibre YieldAnalyzer, YieldEnhancer, YieldServer and LFDTM (litho-friendly design) for design for manufacturing solutions
- Calibre OPC, Calibre nmOPC, Calibre OPCverifyTM, and Calibre MDP for resolution enhancement technologies (RET) and mask data preparation
- Yield Assist™ for advanced yield diagnostics Mentor Consulting is fully aligned with product roadmaps to deliver complete and effective integration of advanced technologies into existing design and manufacturing environments.
Mentor Consulting:Case Study
Case Study: Fast GDSII-to-Mask Turnaround Time (TAT)
For a leading IDM, tapeout turn around time (TAT) for performing resolution enhancement technology (RET) was increasing with each new advanced process node. Long tapeout times were impacting time-to-market and an ability to compete in the marketplace. TAT was also unpredictable with some layers taking >4 times the average TAT to complete.
The customer goals were to reduce average RET TAT by at least 50% for all mask layers and eliminate the problem of unpredictable TAT. In addition, they wanted to optimize hardware utilization. Their main obstacles to achieving these goals were lack of expert resources and proven methodology to accomplish these improvements and assure consistent yield from the optimized solutions.
Mentor Consulting structured the engagement with a systematic approach: Calibre® RET tools release migration, recipe optimization, hardware configuration and sign-off, all performed within an ongoing verification and validation process.
Results exceeded expectations. Average TAT was reduced by 50 to 70 percent. Long RET runs were eliminated. All performance targets were met. The project was completed on time, and the customer was highly satisfied.
Learn More
To see how Mentor Consulting Services has helped our customers meet the tough technical challenges of advanced IC manufacturing, download these White Papers.
Foundry Resources
Mask data preparation flow for advanced technology nodes
White Paper: The trend to reduce critical features dimension has dramatically increased design file size. Design tape–out flows at the 28 nm technology node handle post-OPC data files that reach hundreds of gigabytes.... View White Paper
Roadmap to sub-nanometer OPC model accuracy
White Paper: OPC models describe the entire patterning process, including photomask, optics, resist, and etch as a set of separately characterized modules. It is difficult, however, to definitively calibrate the optics... View White Paper