Calibre RET/OPC Basics
Categories: Calibre
The Calibre® RET/OPC Basics course will help you understand and maintain Calibre rule decks for RET/OPC applications using Calibre’s Standard Verification Rule Format (SVRF) language and the Tcl programming language. View course highlights ↓
Scheduled classes
There are no classes currently scheduled for this course. Request a class
Course Highlights
The lecture modules will guide you through the various concepts underlying state-of-the-art RET/OPC techniques and specific aspects of the Calibre toolset. Hands-on lab exercises will reinforce lecture topics and provide you with rule writing experience under the guidance of our industry expert instructors.
You will learn how to
- Use Calibre nmBIAS for rule-based retargeting
- Use Calibre nmSRAFTM to insert sub-resolution assist features (SRAFs) into a design
- Use Calibre PIXbar to automatically generate SRAFs
- Modify SRAF generation using various options
- Find and correct SRAF conflicts with Mask Rule Constraints (MRCs)
- Create Calibre nmOPCTM setup files
- Specify various nmOPC options and simulation settings
- Control fragmentation options
- Manage OPC correction and convergence
- Write simple nmOPC TCL scripts
- Apply Calibre Process Window OPC (PWOPC) to meet the challenges of the real world lithography process
- Use Calibre SRAF Print Avoidance (SPA) to detect and prevent sub-resolution assist features (SRAFs) from printing
- Integrate OPCverifyTM into the post-tapeout flow
- Write and execute simple OPCverify rule decks
- Generate a basic OPCverify setup file for layer verification
- Perform process window verification in both production and recipe development flows
- Use limiting code in OPCverify to reduce error output
- Analyze OPCverify tabular property data with the Calibre RVE GUI
Hands-on labs
- Running Calibre nmBIAS in rule mode and table mode
- Using LFT for nmSRAF template setup
- Generating SRAFs with Calibre PIXbar
- Using RectCorner and RectEdge with SRAF templates
- Using various SRAF options
- Modifying the minfeaturespace value specified in the setup file in order to get the rectCorner template to resolve
- Reviewing a Calibre nmOPC setup file
- Exploring the impact of corner_control values on fragment sizes
- Examining the impact of scale factor on EPE
- Writing an nmOPC script
- Experimenting with tolerance settings
- Changing model thresholds to determine the impact on SRAF printing errors
- Checking line end EPE
- Finding pinching and bridging areas
- Executing contact coverage and alignment checks
- Generating PV bands
- Examining the portions of the rule file that control MEEF, NILS, and DOF checks
- Working with the error centric flow
Course Details
| Intended for | IC engineers responsible for final mask processing prior to fabrication CAD engineers who support mask preparation IC lithographers who will be using Calibre to improve mask quality |
| Prerequisites |
Thorough knowledge of IC layout techniques and procedures Basic understanding of IC lithography Some experience with Calibre SVRF and Tcl Experience with an IC layout editing tool Familiarity with Unix/Linux |
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