Calibre Dense RET

Duration:  5 Days
Price:  $4,000 USD
Course Part Number: 206557

Contact us for details about training at your site 

Course Overview

In order to meet the increasingly complex computational demands of 65 nm and below technology, a new family of Calibre RET tools has been developed.  These tools are based upon grid-based, or “dense” simulation, as opposed to so called “sparse” simulations used in OPCPro and ORC.  This class will teach you to effectively use the grid based RET tools, empowering you to optimize and verify your designs for maximum manufacturability.  The lecture modules will guide you through the various concepts underlying state-of-the-art resolution enhancement techniques and specific aspects of the Calibre RET toolset. Hands-on lab exercises will reinforce lecture topics and provide you with extensive tool usage experience under the guidance of our industry expert instructors. 

This advanced five day class will teach you how to calibrate CM1 process models which are used for grid based simulations.  It will also teach you how to use nmOPC, the grid-based layout correction tool, as well as OPCverify, the grid-based post OPC verification tool.

Detailed lab exercises help reinforce what is discussed during the lectures and provide you with extensive tool usage experience under the guidance of our industry expert instructors. Please note: This class is not for beginners. The materials assume a substantial understanding of Calibre OPC.

You will learn

• The difference between sparse and dense (grid) based simulations
• The difference between VT5 and CM1 process models.
• How to calibrate CM1 process models.
• How to calibrate Variable Etch Bias etch models.
• How to use ContourCal for SEM image based process model calibration
• How to create and optimize a basic nmOPC recipe
• How to use advanced nmOPC features such as mask and image constraints, Process Window correction, retarget and smoothed layers.
• How to use advanced fragmentation features of nmOPC.
• How to use script controlled fragment modification for nmOPC recipes.
• How to create OPCverify recipes to verify OPC corrected layouts, using SVRF or the Verification Center GUI. 

Hands-On Labs

Throughout this course, extensive hands-on lab exercises provide you with practical experience in using grid-based Calibre RET tools under the guidance of our expert instructors. Hands-on lab topics include:   

• CM1 Model Calibration
• VEB Model Calibration
• Use of   LITHO DENSEOPC
• Use of fragmentation controls, MRC, and PW constraints in nmOPC
• Use of Preclean, OPC Repair, and target smooting controls in nmOPC
• Use of nmOPC scripting
• Runtime and accuracy tradeoffs for OPCverify
• Process Window checks in OPCverify.
• Pinch /Bridge, measure, coverage/enclosure, endcap, and gate_stats checks in OPCverify.
• Use of TVF/TCL looping in OPCverify 

Audience

• Tapeout specialists, integration specialists, lithographers, and process engineers who will use Calibre RET tools for 65 nm and below technologies.
• CAD Engineers and Managers who will be responsible for integration of the Calibre toolset in their design flow

Prerequisites

 

• Knowledge of IC Layout concepts
• Familiarity with UNIX
• Knowledge of layout verification concepts      and tools (helpful but not required)
• Calibre RET

 

Key Topics

• VEB model calibration
• Grid-Based simulation basics
• nmOPC
• OPCverify
• CoProcessor Acceleration