Duration: 2 Days
Price: $1,600 USD
Course Part Number: 223524
Contact us for details about training at your site Course Overview
In order to meet the increasingly complex computational demands of 65 nm and below technology, a new family of Calibre RET tools has been developed. These tools are based upon grid-based, or “dense” simulation, as opposed to so called “sparse” simulations used in Calibre OPCPro and ORC. This class will teach you to effectively use OPCverify, one of the new grid-based RET tools. The lecture modules will guide you through the features and capabilities of OPCverify. Hands-on lab exercises will reinforce lecture topics and provide you with extensive tool usage experience under the guidance of our industry expert instructors.
This two-day class will teach you how to utilize the full range of mask verification features offered by OPCverify. You will learn how to set up a variety of analysis and how to visualize results in your layout editor and/or in reports and charts (where applicable).
Detailed lab exercises help reinforce what is discussed during the lectures and provide you with extensive tool usage experience under the guidance of our industry expert instructors.
Please note: This class is not for beginners. The materials assume a substantial understanding of Calibre OPC.
You will learn
- The difference between sparse and dense (grid) based simulations
- How to use OPCverify to help you assess the impact of process variation on your corrected masks.
- How to predict where bridging and pinching are most likely to occur using OPCverify commands.
- How to determine where gate critical dimensions will be in jeopardy.
- How to check gate/active overlap and contact enclosure.
- How to use OPCverify to perform EPE and MEEF checks.
- How to use the powerful Verification Center GUI to create, run, and analyze OPCverify jobs.
Hands-On Labs
Throughout this course, extensive hands-on lab exercises provide you with practical experience in using OPCverify under the guidance of our expert instructors. Hands-on lab topics include:
- Runtime and accuracy tradeoffs for OPCverify
- Process Window checks in OPCverify.
- Pinch /Bridge, measure, coverage/enclosure, endcap, and gate_stats checks in OPCverify.
- Use of TVF/TCL looping in OPCverify
- Use of the Verification Center GUI to set up and run OPCverify jobs.
Audience
- Tapeout specialists, integration specialists, lithographers, and process engineers who will use Calibre RET tools for 65 nm and below technologies.
- CAD Engineers and Managers who will be responsible for integration of the Calibre toolset in their design flow
Prerequisites
- Knowledge of IC Layout concepts
- Familiarity with mask resolution enhancement technology issues and techniques
- Familiarity with UNIX
- Knowledge of layout verification concepts and tools (helpful but not required)
Key Topics
- Hard pinch/bridge analysis
- EPE measurement
- Critical dimension measurement
- Soft pinch/bridge analysis
- Contact coverage
- Poly/active overlap analysis
- TVF/TCL overview
- MEEF analysis
- NILS analysis
- Dealing with notches
- Finding extra printing features
- Job log file analysis
- Verification Center GUI
